Boron (B) Granules, 99.9%-99.99% Purity

Boron (B) Granules, 99.9%-99.99% Purity

ZHC LAB Boron (B) granules are high-purity evaporation source materials supplied for thin-film deposition research, PVD source loading, compound precursor studies, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and clean handling are important.

Key Features

High-Purity Elemental Source Material
Available purity options include 99.9% (3N), 99.99% (4N) for research workflows that require controlled metal composition.

Pellet and Piece Formats
Available particle or piece sizes include 0.118 in-0.315 in (3-8 mm) granules/pieces. Package options include 1 kg, 100 g, 500 g, 50 g, 25 g, 250 g, 10 g depending on selected purity and size.

Clean Handling and Storage
Store sealed in a dry environment. Handle with clean gloves or tweezers and avoid contact with oils, dust, moisture, or other contaminants before use.

Technical Specifications

Material: Boron (B)
Form: Granules
Purity Options: 99.9% (3N), 99.99% (4N)
Available Size Options: 0.118 in-0.315 in (3-8 mm) granules/pieces
Package Options: 1 kg, 100 g, 500 g, 50 g, 25 g, 250 g, 10 g
Category: Evaporation Materials
Typical Use: Evaporation source material, PVD research, alloy preparation, and laboratory materials science

Material Properties and Technical Indicators

The following material-property values are provided as reference technical indicators for material selection, source loading, process planning, and thin-film deposition evaluation:

– Element symbol: B
– CAS number: 7740-42-8
– Density: 2.08 g·cm-3
– Physical state: solid
– Melting point: 2076 °C
– Boiling point: 3927 °C
– Heat of fusion: 50.2 kJ·mol-1
– Heat of vaporization: 480 kJ·mol-1
– Specific heat capacity: 11.087 J·mol-1·K-1
– Magnetic order: diamagnetic
– Speed of sound, thin rod: (20 °C)16,200 m/s
– Thermal conductivity: 27.4 W·m-1·K-1
– Electrical resistivity: (20 °C)~106 Ω·m
– Mohs hardness: 9.5

Quality-Control and Handling Indicators

Additional technical indicators reflected from the source product page:

– Analytical checks: ICP-MS trace-element analysis; ICP impurity/composition analysis; GDMS trace-metal analysis; carbon/sulfur impurity analysis; nitrogen/oxygen impurity analysis.
– Inspection focus: surface cleanliness measurement; micrometer dimensional inspection; appearance inspection; dimensional verification.
– Handling and storage: sealed dry storage and protective packaging; clean-glove handling to avoid oil, dust, moisture, and surface contamination; careful handling to prevent compression, impact, or chipping.
– Deposition-use context: magnetron sputtering systems; ion sputtering systems; micro/nano fabrication research; semiconductor thin-film development; photovoltaic materials research; flat-panel display coating research.

Common Applications

– boron evaporation source loading
– boride, dopant, and precursor material research
– semiconductor and thin-film process development
– laboratory materials synthesis workflows
– Academic, industrial, and pilot-scale materials research