Copper (Cu) Wire, 99.99% Purity (Request Current Price)

Copper (Cu) Wire, 99.99% Purity (Request Current Price)

ZHC LAB Copper (Cu) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material identity, purity, and clean handling are important. Pricing requires a current quote because high-purity wire and rod costs vary with purity, diameter, package size, and material market conditions.

Key Features

High-Purity Source Material
Available purity options include 99.99% (4N) for research workflows that require controlled source composition.

Wire and Rod Form Factor
Available diameter and rod-size options include 0.00787 in dia (0.2 mm) wire, 0.0118 in dia (0.3 mm) wire, 0.0157 in dia (0.4 mm) wire, 0.0197 in dia (0.5 mm) wire, 0.0394 in dia (1 mm) wire, 0.0787 in dia (2 mm) wire, 0.118 in dia (3 mm) wire. Package options include 1 kg, 100 g depending on selected purity and size.

Clean Handling and Storage
Store sealed in a dry environment. Handle with clean gloves or tweezers and avoid contact with oils, dust, moisture, or other contaminants before use.

Technical Specifications

Material: Copper (Cu)
Form: Wire
Purity Options: 99.99% (4N)
Available Size Options: 0.00787 in dia (0.2 mm) wire, 0.0118 in dia (0.3 mm) wire, 0.0157 in dia (0.4 mm) wire, 0.0197 in dia (0.5 mm) wire, 0.0394 in dia (1 mm) wire, 0.0787 in dia (2 mm) wire, 0.118 in dia (3 mm) wire
Package Options: 1 kg, 100 g
Category: Wires & Filaments
Typical Use: PVD source loading, wire evaporation research, filament-related studies, alloy preparation, and laboratory materials science

Material Properties and Technical Indicators

The following material-property values are provided as reference technical indicators for material selection, source loading, process planning, and thin-film deposition evaluation:

– Element symbol: Cu
– CAS number: 7440-50-8
– Density: 8.96 g·cm-3
– Physical state: solid
– Melting point: 1084.62 °C
– Boiling point: 2562 °C
– Heat of fusion: 13.26 kJ·mol-1
– Heat of vaporization: 300.4 kJ·mol-1
– Specific heat capacity: 24.860 J·mol- 1·K-1
– Crystal structure: face-centered cubic
– Magnetic order: diamagnetic
– Thermal expansion coefficient: (25 °C)16.5 m·m-1·K-1
– Thermal conductivity: 401 W·m-1·K-1
– Electrical resistivity: (20 °C)1.678×10-8 uΩ·m
– Young’s modulus: 110-128 GPa
– Shear modulus: 48 GPa
– Bulk modulus: 140 GPa
– Mohs hardness: 3.0
– Brinell hardness: 235-878 MPa
– Poisson’s ratio: 0.34

Quality-Control and Handling Indicators

Additional technical indicators reflected from the source product page:

– Analytical checks: ICP-MS trace-element analysis; ICP impurity/composition analysis; GDMS trace-metal analysis; carbon/sulfur impurity analysis; nitrogen/oxygen impurity analysis.
– Inspection focus: surface cleanliness measurement; micrometer dimensional inspection; appearance inspection; dimensional verification.
– Handling and storage: sealed dry storage and protective packaging; clean-glove handling to avoid oil, dust, moisture, and surface contamination; careful handling to prevent compression, impact, or chipping.

Common Applications

– copper wire source loading for deposition and materials research
– electrical contact and conductive film development
– high-purity alloy preparation
– laboratory PVD and materials science workflows
– Academic, industrial, and pilot-scale materials research