Graphite (C) Chamfered Crucible, 99.99% Purity (Request Current Price)

Graphite (C) Chamfered Crucible, 99.99% Purity (Request Current Price)

ZHC LAB Graphite (C) chamfered crucible is a deposition accessory supplied for thin-film laboratories, vacuum coating systems, thermal evaporation setups, and PVD research workflows. It is intended for clean source loading, fixture replacement, and controlled materials handling where compatibility with high-purity deposition work matters. Pricing requires a current quote because accessory cost depends on configuration, package size, and current material availability.

Key Features

Deposition Accessory for Lab Vacuum Systems
Designed for use as a chamfered crucible in evaporation, PVD, and research coating workflows.

Material and Configuration Options
Available material or purity options include 99.99% (4N), Material: Graphite (C). Configuration options include 7 cc capacity, 15 cc capacity, 40 cc capacity, 25 cc capacity, Top OD 1.67 in (42.49 mm); Height 0.768 in (19.5 mm); Wall thickness 0.0929 in (2.36 mm); D chamfer angle 15 deg; chamfered; per drawing.

Clean Handling and Storage
Store sealed in a dry environment. Handle with clean gloves or tweezers and avoid oils, dust, moisture, or surface contamination before installation.

Technical Specifications

Material: Graphite (C)
Accessory Type: Chamfered Crucible
Purity / Material Options: 99.99% (4N), Material: Graphite (C)
Available Capacity or Dimension Options: 7 cc capacity, 15 cc capacity, 40 cc capacity, 25 cc capacity, Top OD 1.67 in (42.49 mm); Height 0.768 in (19.5 mm); Wall thickness 0.0929 in (2.36 mm); D chamfer angle 15 deg; chamfered; per drawing
Package Options: each
Category: Deposition Accessories
Typical Use: Thermal evaporation, PVD setup, vacuum coating, source containment, and laboratory deposition support

Material Properties and Technical Indicators

The following material-property values are provided as reference technical indicators for material selection, source loading, process planning, and thin-film deposition evaluation:

– Element symbol: C
– CAS number: 7740-44-0
– Physical state: solid
– Sublimation point: 3642 °C
– Triple point: 4327 °C
– Crystal structure: diamond cubic
– Magnetic order: diamagnetic
– Thermal expansion coefficient: (25 °C)0.8(diamond cubic)[10] m·m-1·K-1
– Speed of sound, thin rod: (20 °C)18350(diamond cubic) m/s
– Young’s modulus: 1050(diamond cubic)[10] GPa
– Shear modulus: 478(diamond cubic)[10] GPa
– Bulk modulus: 442(diamond cubic)[10] GPa

Quality-Control and Handling Indicators

Additional technical indicators reflected from the source product page:

– Analytical checks: ICP impurity/composition analysis.
– Inspection focus: dimensional verification.

Common Applications

– thermal evaporation and e-beam evaporation source containment
– high-temperature vacuum deposition accessory use
– laboratory PVD process setup and material loading
– custom crucible selection for research coating systems
– Academic, industrial, and pilot-scale thin-film research