Showing 177–192 of 1047 results
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$89.99 – $414.99Price range: $89.99 through $414.99
Chromium (Cr) Sputtering Target, 99.95%-99.99% Purity, Circular ZHC LAB’s Chromium (Cr) sputtering target is a 99.95%-99.99% purity transition-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important….
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$9,999.99
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 60:20:17:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 60:20:17:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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$9,999.99
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 67:22:8:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 67:22:8:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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$9,999.99
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity antimonide compound source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$9,999.99
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Cr:Sb = 1:1.2 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity, cr:sb = 1:1.2 at% antimonide compound source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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$128.99 – $188.99Price range: $128.99 through $188.99
Chromium Carbide (Cr3C2) Evaporation Pellets, 99.5% Purity ZHC LAB Chromium Carbide (Cr3C2) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…
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$480.99 – $941.99Price range: $480.99 through $941.99
Chromium Carbide (Cr3C2) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Carbide (Cr3C2) sputtering target is a 99.5% purity transition-metal carbide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$9,999.99
Chromium Carbon Alloy (CrC) Pellets And Pieces, 99% Purity (Request Current Price) ZHC LAB Chromium Carbon Alloy (CrC) pellets and pieces are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows…
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$584.99 – $934.99Price range: $584.99 through $934.99
Chromium Diboride (CrB2) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Diboride (CrB2) sputtering target is a 99.5% purity transition-metal boride ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$406.99 – $870.99Price range: $406.99 through $870.99
Chromium Disilicide (CrSi2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Chromium Disilicide (CrSi2) sputtering target is a 99.9% purity transition-metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Chromium Niobium Alloy (CrNb) Ingots, 99.9% Purity (Request Current Price) ZHC LAB Chromium Niobium Alloy (CrNb) ingots are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity…
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$120.99 – $213.99Price range: $120.99 through $213.99
Chromium Nitride (CrN) Evaporation Pellets, 99.99% Purity ZHC LAB Chromium Nitride (CrN) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…
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$506.99 – $1,013.99Price range: $506.99 through $1,013.99
Chromium Nitride (CrN) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Nitride (CrN) sputtering target is a 99.5% purity transition-metal nitride ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$9,999.00
Chromium Oxide (Cr2O3) Single Crystal Substrate Physical Properties: – Crystal Structure: Hexagonal / Trigonal – Lattice Constant: a=4.96Angstrom , b=4.96Angstrom , c=13.6Angstrom – Melting Point: 2435 °C – Density: 5.22 g/cm^3 – Mohs Hardness: 9 (Mohs) – Color: light to dark green , fine crystals – Streak: greenish – Cleavage Plane: (11-20) Standard Specifications: –…
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$9,999.99
Chromium Vanadium Alloy (CrV) Sputtering Target, 99.9% Purity, Cr:V = 1:1 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Vanadium Alloy (CrV) sputtering target is a 99.9% purity, cr:v = 1:1 at% binary transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$9,999.99
Chromium-Coated Tungsten (Cr/W) Evaporation Wire, 99.9% Purity (Request Current Price) ZHC LAB Chromium-Coated Tungsten (Cr/W) evaporation wire is a deposition accessory supplied for thin-film laboratories, vacuum coating systems, thermal evaporation setups, and PVD research workflows. It is intended for clean source loading, fixture replacement, and controlled materials handling where compatibility with high-purity deposition work matters….
