Showing 1–16 of 233 results
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$97.99 – $294.99Price range: $97.99 through $294.99
Aluminum (Al) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) ZHC LAB’s Aluminum (Al) sputtering target is a high-purity high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$113.99 – $131.99Price range: $113.99 through $131.99
Aluminum (Al) Sputtering Target, 99.999% Purity, SEM Coating Grade, Circular ZHC LAB’s Aluminum (Al) sputtering target is a 99.999% purity, sem coating grade high-purity metal source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request) ZHC LAB’s Aluminum Copper Alloy (AlCu) sputtering target is a 99.999% purity, al:cu = 95:5 at% high-purity aluminum alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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$657.99 – $1,233.99Price range: $657.99 through $1,233.99
Aluminum Diboride (AlB2) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Aluminum Diboride (AlB2) sputtering target is a 99.5% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$341.99 – $606.99Price range: $341.99 through $606.99
Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Aluminum Nitride (AlN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$270.99 – $1,108.99Price range: $270.99 through $1,108.99
Aluminum Oxide (Al2O3) Sputtering Target, 99.99% Purity, Circular (Select Options Price Upon Request) ZHC LAB’s Aluminum Oxide (Al2O3) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$159.99 – $331.99Price range: $159.99 through $331.99
Aluminum-Doped Zinc Oxide (AZO) Sputtering Target, 99.99% Purity, ZnO:Al2O3 = 98:2 wt%, Circular ZHC LAB’s Aluminum-Doped Zinc Oxide (AZO) sputtering target is a 99.99% purity, zno:al2o3 = 98:2 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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$9,999.99
Antimony (Sb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Antimony (Sb) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Antimony Selenide (Sb2Se3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Antimony Selenide (Sb2Se3) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Antimony Telluride (Sb2Te3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Antimony Telluride (Sb2Te3) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Barium Strontium Titanate (BST) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Barium Strontium Titanate (BST) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Barium Titanate (BaTiO3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Barium Titanate (BaTiO3) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$137.99 – $334.99Price range: $137.99 through $334.99
Bismuth (Bi) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Bismuth (Bi) sputtering target is a 99.99% purity high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
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$9,999.99
Bismuth Antimony Telluride (BiSbTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Bismuth Antimony Telluride (BiSbTe) sputtering target is a 99.99% purity thermoelectric chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where…
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$463.99 – $749.99Price range: $463.99 through $749.99
Bismuth Ferrite (BiFeO3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Bismuth Ferrite (BiFeO3) sputtering target is a 99.9% purity multiferroic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$9,999.99
Bismuth Iron Garnet (Bi3Fe5O12) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) ZHC LAB’s Bismuth Iron Garnet (Bi3Fe5O12) sputtering target is a high-purity magneto-optic oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
