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Showing 449–464 of 1047 results
Indium (In) Sputtering Target, 99.995% Purity, Circular (Price Upon Request) ZHC LAB’s Indium (In) sputtering target is a 99.995% purity soft post-transition metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
Indium (In) Wire, 99.995%-99.9999% Purity (Request Current Price) ZHC LAB Indium (In) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material…
Indium Antimonide (InSb) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Indium Antimonide (InSb) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
Indium Antimonide (InSb) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=6.48 Angstrom – Density: 5.775 g/cm^3 – Melting Point: 527 °C Standard Specifications: – Type/Doping: N-type – Orientation: (111) – Dimensions: dia 2 inch x 0.5 mm – Surface Finish: Double-Side Polished In face CMP
Indium Antimonide (InSb) Single Crystal Wafers Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=6.48 Angstrom – Density: 5.775 g/cm^3 – Melting Point: 527 °C Standard Specifications: – Type/Doping: N-type – Orientation: (111) – Dimensions: dia 2 inch x 0.5 mm – Surface Finish: Double-Side Polished In face CMP
Indium Antimonide (InSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Indium Antimonide (InSb) sputtering target is a 99.99% purity III-V compound semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
Indium Arsenide (InAs) Single Crystal Substrates, <100> Orientation， 2 pcs/pack Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=6.058 Angstrom – Melting Point: 942 °C – Density: 5.66 g/cm^3 Standard Specifications (by Type): 1. N-type/undoped – Doping Concentration: <= 3 x 10^16 cm^-3 – Mobility: >= 2 x 10^4 cm^2/V.s – Dislocation Density:…
Indium Arsenide (InAs) Single Crystal Substrates, <111> Orientation， 2 pcs/pack Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=6.058 Angstrom – Melting Point: 942 °C – Density: 5.66 g/cm^3 Standard Specifications (by Type): 1. N-type/undoped – Doping Concentration: <= 3 x 10^16 cm^-3 – Mobility: >= 2 x 10^4 cm^2/V.s – Dislocation Density:…
Indium Arsenide (InAs) Single Crystal Wafers, <100> Orientation Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=6.058 Angstrom – Melting Point: 942 °C – Density: 5.66 g/cm^3 Standard Specifications (by Type): 1. N-type/undoped – Doping Concentration: <= 3 x 10^16 cm^-3 – Mobility: >= 2 x 10^4 cm^2/V.s – Dislocation Density: < 3…
Indium Arsenide (InAs) Single Crystal Wafers, <111> Orientation Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=6.058 Angstrom – Melting Point: 942 °C – Density: 5.66 g/cm^3 Standard Specifications (by Type): 1. N-type/undoped – Doping Concentration: <= 3 x 10^16 cm^-3 – Mobility: >= 2 x 10^4 cm^2/V.s – Dislocation Density: < 3…
Porous Indium Foam Applications: Electrode substrate for batteries, catalyst support, thermal dissipation material, acoustic damping and shielding material, filtration media, and scientific research materials. Packaging: 200 mm x 100 mm x 2 mm sheets; 200 mm x 300 mm x 2 mm sheets. Description: This indium foam features a highly porous, open-cell metallic network with…
High-Purity Indium Foil Application: Indium Source Precursor, Electronic Heat Dissipation/Cooling Material, Semiconductor Applications Product Overview: This indium foil is characterized by its low melting point, low electrical resistance, corrosion resistance, and excellent thermal and electrical conductivity. It is widely utilized in the electronics and wireless communications industries. Key Specifications: Purity: > 99.99% Melting Point: 156…
Indium Gallium Selenide (InGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) ZHC LAB’s Indium Gallium Selenide (InGaSe) sputtering target is a 99.99% purity, custom composition custom indium gallium chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In2O3:Ga2O3:ZnO = 1:1:1 mol%, Circular (Price Upon Request) ZHC LAB’s Indium Gallium Zinc Oxide (IGZO) sputtering target is a 99.99% purity, in2o3:ga2o3:zno = 1:1:1 mol% transparent oxide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In2O3:Ga2O3:ZnO = 1:1:2 mol%, Circular (Price Upon Request) ZHC LAB’s Indium Gallium Zinc Oxide (IGZO) sputtering target is a 99.99% purity, in2o3:ga2o3:zno = 1:1:2 mol% transparent oxide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
Indium Oxide (In2O3) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Indium Oxide (In2O3) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
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