
Vanadium (V) Wire, 99.95% Purity (Request Current Price)
$9,999.99
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Vanadium (V) Wire, 99.95% Purity (Request Current Price)
ZHC LAB Vanadium (V) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material identity, purity, and clean handling are important. Pricing requires a current quote because high-purity wire and rod costs vary with purity, diameter, package size, and material market conditions.
Key Features
High-Purity Source Material
Available purity options include 99.95% (3N5) for research workflows that require controlled source composition.
Wire and Rod Form Factor
Available diameter and rod-size options include 0.118 in dia (3 mm) wire. Package options include 1 kg depending on selected purity and size.
Clean Handling and Storage
Store sealed in a dry environment. Handle with clean gloves or tweezers and avoid contact with oils, dust, moisture, or other contaminants before use.
Technical Specifications
Material: Vanadium (V)
Form: Wire
Purity Options: 99.95% (3N5)
Available Size Options: 0.118 in dia (3 mm) wire
Package Options: 1 kg
Category: Wires & Filaments
Typical Use: PVD source loading, wire evaporation research, filament-related studies, alloy preparation, and laboratory materials science
Quality-Control and Handling Indicators
Additional technical indicators reflected from the source product page:
– Analytical checks: ICP impurity/composition analysis; XRD phase verification.
– Inspection focus: non-destructive inspection; density/compactness evaluation; surface cleanliness measurement; micrometer dimensional inspection; precision caliper dimensional inspection; appearance inspection; dimensional verification.
– Handling and storage: sealed dry storage and protective packaging; clean-glove handling to avoid oil, dust, moisture, and surface contamination; careful handling to prevent compression, impact, or chipping.
– Deposition-use context: magnetron sputtering systems; ion sputtering systems; micro/nano fabrication research; semiconductor thin-film development; photovoltaic materials research.
Common Applications
– vanadium source wire for materials research
– transition-metal alloy preparation
– functional coating and thin-film studies
– laboratory-scale PVD process development
– Academic, industrial, and pilot-scale materials research
| option | 99.95% (3N5) |
|---|---|
| option1 | 0.118 in dia (3 mm) wire |
| option2 | 1 kg |

