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Showing 593–608 of 1047 results
Molybdenum (Mo) Wire, 99.95% Purity (Request Current Price) ZHC LAB Molybdenum (Mo) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material…
Molybdenum Carbide (Mo2C) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Carbide (Mo2C) sputtering target is a 99.9% purity transition-metal carbide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
Molybdenum Diboride (MoB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Diboride (MoB2) sputtering target is a 99.5% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Molybdenum Dioxide (MoO2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Dioxide (MoO2) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Molybdenum Diselenide (MoSe2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Diselenide (MoSe2) sputtering target is a 99.99% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Molybdenum Disilicide (MoSi2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Disilicide (MoSi2) sputtering target is a 99.9% purity refractory metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
Molybdenum Disulfide (MoS2) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Molybdenum Disulfide (MoS2) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
Molybdenum Disulfide (MoS2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Disulfide (MoS2) sputtering target is a 99.99% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Molybdenum Ditelluride (MoTe2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Ditelluride (MoTe2) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Molybdenum Rhenium Alloy (MoRe) Sputtering Target, 99.95% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Rhenium Alloy (MoRe) sputtering target is a 99.95% purity refractory binary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work…
Molybdenum Trioxide (MoO3) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Molybdenum Trioxide (MoO3) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
Molybdenum Trioxide (MoO3) Sputtering Target, 99.99% Purity, Conductive and Non-Conductive Grades, Circular (Price Upon Request) ZHC LAB’s Molybdenum Trioxide (MoO3) sputtering target is a 99.99% purity, conductive and non-conductive grades oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
MSK-110 Hydraulic Coin Cell Crimper / Sealing Machine & Crimping Die Product Overview: The MSK-110 is a hydraulic crimping machine designed for sealing coin cell batteries. It supports various die sets for different battery sizes, ensuring precise and reliable sealing for laboratory research. Compatibility & Specifications: – Functionality: Supports both Sealing (Crimping) and Disassembly operations…
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