Showing 49–64 of 1047 results
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$9,999.99
Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request) ZHC LAB’s Aluminum Copper Alloy (AlCu) sputtering target is a 99.999% purity, al:cu = 95:5 at% high-purity aluminum alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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$657.99 – $1,233.99Price range: $657.99 through $1,233.99
Aluminum Diboride (AlB2) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Aluminum Diboride (AlB2) sputtering target is a 99.5% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$306.99 – $1,671.99Price range: $306.99 through $1,671.99
Aluminum Fluoride (AlF3) Crystal Evaporation Pellets, 99.99% Purity ZHC LAB Aluminum Fluoride (AlF3) crystal evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled…
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$239.99 – $319.99Price range: $239.99 through $319.99
Aluminum Foam Application: Thermal Management Materials, Filtration Materials, Sound Absorbing Materials Product Overview: Manufactured using a specialized foaming process, this material combines the characteristics of metal and gas bubbles. It features low density, high impact absorption capacity, high temperature resistance, strong fire resistance, corrosion resistance, sound insulation/noise reduction, and low thermal conductivity. Packaging Unit: Sheet…
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$189.99
Aluminum Foil for Aqueous System (Sodium-ion Battery) Application: Current Collector for Aqueous Battery Electrodes Product Overview: This product consists of an aluminum foil substrate modified with specific additives, specifically engineered for use as a current collector in aqueous electrolyte battery systems. It features high surface wettability and strictly controlled mechanical properties. Total Thickness: 12.00 ±…
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$9,999.99
Aluminum Indium Alloy (AlIn) Pellets And Pieces, 99.9% Purity (Request Current Price) ZHC LAB Aluminum Indium Alloy (AlIn) pellets and pieces are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows…
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$69.99 – $159.99Price range: $69.99 through $159.99
High-Performance Aluminum Laminated Film (Shodex Material) Overview: This aluminum laminated film is specifically designed for pouch cell case applications, offering excellent electrical insulation and chemical resistance. – Material: Shodex Aluminum Laminated Film. – Surface Quality: Features a mat finish. – Quality Standards: Strict inspection for pinholes (applicable aluminum foil standards), impurities (<=1 mm diameter), and…
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$9,999.99
Aluminum Manganese Alloy (AlMn) Pellets And Pieces, 99.9% Purity (Request Current Price) ZHC LAB Aluminum Manganese Alloy (AlMn) pellets and pieces are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows…
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$69.00 – $99.00Price range: $69.00 through $99.00
Aluminum Nitride (AlN) Ceramic Substrate Product Description: Aluminum Nitride (AlN) ceramics are next-generation materials known for exceptional thermal conductivity (7-10 times higher than Alumina). These substrates offer low dielectric constants, reliable insulation, and superior mechanical strength. They are non-toxic, heat-resistant, and chemically corrosion-resistant, with a thermal expansion coefficient close to that of Silicon.
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$128.99 – $291.99Price range: $128.99 through $291.99
Aluminum Nitride (AlN) Evaporation Pellets, 99.99% Purity ZHC LAB Aluminum Nitride (AlN) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…
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$459.00 – $899.00Price range: $459.00 through $899.00
Aluminum Nitride (AlN) Film on Sapphire Wafer Template Application: Designed as a high-quality template for the epitaxial growth of AlGaN-based deep UV LEDs, HEMTs, and other wide bandgap optoelectronic devices. It eliminates the complex nucleation step, improving subsequent layer quality. Product Overview: This product consists of a high-quality epitaxial Aluminum Nitride (AlN) thin film grown…
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$9,999.00
Aluminum Nitride (AlN) Single Crystal Substrate Application: Ideal for UV-LEDs, high-power/high-frequency electronic devices, and surface acoustic wave (SAW) devices due to its wide bandgap and high thermal conductivity. Product Overview: This product features high-quality Aluminum Nitride (AlN) single crystals grown via Physical Vapor Transport (PVT). It provides a native substrate for AlGaN-based deep-ultraviolet (DUV) optoelectronics,…
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$341.99 – $606.99Price range: $341.99 through $606.99
Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Aluminum Nitride (AlN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$9,999.99
Aluminum Oxide (Al2O3) Crucible, 99.9% Purity (Request Current Price) ZHC LAB Aluminum Oxide (Al2O3) crucible is a deposition accessory supplied for thin-film laboratories, vacuum coating systems, thermal evaporation setups, and PVD research workflows. It is intended for clean source loading, fixture replacement, and controlled materials handling where compatibility with high-purity deposition work matters. Pricing requires…
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$270.99 – $1,108.99Price range: $270.99 through $1,108.99
Aluminum Oxide (Al2O3) Sputtering Target, 99.99% Purity, Circular (Select Options Price Upon Request) ZHC LAB’s Aluminum Oxide (Al2O3) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$59.00 – $69.00Price range: $59.00 through $69.00
Aluminum Oxide (Al2O3) Thin Film on Si (100) Substrates – 10 × 10 mm Overview Our aluminum oxide (Al2O3) thin film substrates are precision-cut from research-grade Al2O3-coated Si (100) wafers. These substrates provide high-quality dielectric and surface passivation layers suitable for semiconductor research, interface engineering, and thin film device development. Al2O3 thin films offer excellent…
