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Showing 353–368 of 1047 results

GaN film on Sapphire Substrates
Price range: $62.00 through $131.00
GaN film on Sapphire Substrates Standard Specifications: – GaN film Orientation: C-plane (0001) off angle toward A-axis 0.2° ± 0.1° – Al2O3 Substrate Orientation: C-plane (0001) off angle toward M-axis 0.2° ± 0.1° – Al2O3 Substrate Thickness: 430 ± 25 um – Al2O3 Substrate Surface Finish: Single-Side Polished / Double-Side Polished – Al2O3 Substrate Roughness:…

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GaN film on Sapphire Wafers
Price range: $495.00 through $505.00
GaN film on Sapphire wafers Standard Specifications: – GaN film Orientation: C-plane (0001) off angle toward A-axis 0.2° ± 0.1° – Al2O3 Substrate Orientation: C-plane (0001) off angle toward M-axis 0.2° ± 0.1° – Al2O3 Substrate Thickness: 430 ± 25 um – Al2O3 Substrate Surface Finish: Single-Side Polished / Double-Side Polished – Al2O3 Substrate Roughness:…

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Germanium (Ge) Granules, 99.999%-99.9999% Purity (Request Current Price)
$9,999.99
Germanium (Ge) Granules, 99.999%-99.9999% Purity (Request Current Price) ZHC LAB Germanium (Ge) granules are high-purity evaporation source materials supplied for thin-film deposition research, PVD source loading, compound precursor studies, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and clean handling…

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Germanium (Ge) Single Crystal Substrates
Price range: $99.00 through $139.00
Germanium (Ge) Single Crystal Substrates Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: 5.6754 Angstrom – Melting Point: 937.4 °C – Density: 5.323 g/cm^3 – Growth Method: CZ Standard Specifications (by Product): Product 1: – Type/Doping: N-type/Sb-doped – Orientation: (111) ± 0.5° – Resistivity: 5~40 ohm-cm – Surface Finish: Single-Side Polished – Dislocation…

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Germanium (Ge) Single Crystal Wafers
Price range: $129.00 through $989.00
Germanium (Ge) Single Crystal Wafers Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: 5.6754 Angstrom – Melting Point: 937.4 °C – Density: 5.323 g/cm^3 – Growth Method: CZ Standard Specifications (by Product): Product 1: – Type/Doping: N-type/Sb-doped – Orientation: (111) ± 0.5° – Resistivity: 5~40 ohm-cm – Surface Finish: Single-Side Polished – Dislocation…

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Germanium (Ge) Sputtering Target, 99.9999% Purity, Circular (Price Upon Request)
$9,999.99
Germanium (Ge) Sputtering Target, 99.9999% Purity, Circular (Price Upon Request) ZHC LAB’s Germanium (Ge) sputtering target is a 99.9999% purity high-purity semiconductor material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 1:2:4 at%, Circular (Price Upon Request)
$9,999.99
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 1:2:4 at%, Circular (Price Upon Request) ZHC LAB’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 1:2:4 at% phase-change chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…

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Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 2:2:5 at%, Circular (Price Upon Request)
$9,999.99
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 2:2:5 at%, Circular (Price Upon Request) ZHC LAB’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 2:2:5 at% phase-change chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…

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Germanium Dioxide (GeO2) Sputtering Target, 99.99% Purity, Circular
Price range: $727.99 through $999.99
Germanium Dioxide (GeO2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Dioxide (GeO2) sputtering target is a 99.99% purity oxide glass and ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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Germanium Diselenide (GeSe2) Sputtering Target, 99.99% Purity, Circular
Price range: $799.99 through $1,241.99
Germanium Diselenide (GeSe2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Diselenide (GeSe2) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…

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Germanium Disulfide (GeS2) Sputtering Target, 99.99% Purity, Circular
Price range: $1,113.99 through $1,827.99
Germanium Disulfide (GeS2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Disulfide (GeS2) sputtering target is a 99.99% purity chalcogenide compound source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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Germanium Selenide (GeSe) Sputtering Target, 99.99% Purity, Circular
Price range: $899.99 through $1,370.99
Germanium Selenide (GeSe) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Selenide (GeSe) sputtering target is a 99.99% purity chalcogenide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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Germanium Selenide (GeSe2) Evaporation Pellets, 99.99% Purity
Price range: $320.99 through $841.99
Germanium Selenide (GeSe2) Evaporation Pellets, 99.99% Purity ZHC LAB Germanium Selenide (GeSe2) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…

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Germanium Sulfide (GeS) Sputtering Target, 99.99% Purity, Circular
Price range: $1,113.99 through $1,927.99
Germanium Sulfide (GeS) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Sulfide (GeS) sputtering target is a 99.99% purity chalcogenide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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Germanium Telluride (GeTe) Evaporation Pellets, 99.99% Purity
Price range: $506.99 through $2,399.99
Germanium Telluride (GeTe) Evaporation Pellets, 99.99% Purity ZHC LAB Germanium Telluride (GeTe) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…

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Germanium Telluride (GeTe) Sputtering Target, 99.99% Purity, Circular
Price range: $656.99 through $1,346.99
Germanium Telluride (GeTe) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Telluride (GeTe) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…

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