Showing 865–880 of 1047 results
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$9,999.99
Tantalum (Ta) Evaporation Boat, High-Purity (Request Current Price) ZHC LAB Tantalum (Ta) evaporation boat is a deposition accessory supplied for thin-film laboratories, vacuum coating systems, thermal evaporation setups, and PVD research workflows. It is intended for clean source loading, fixture replacement, and controlled materials handling where compatibility with high-purity deposition work matters. Pricing requires a…
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$9,999.99
Tantalum (Ta) Pellets And Pieces, 99.95%-99.99% Purity (Request Current Price) ZHC LAB Tantalum (Ta) pellets and pieces are high-purity source materials supplied for thin-film deposition research, evaporation source loading, alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and…
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$86.99 – $2,424.99Price range: $86.99 through $2,424.99
Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum (Ta) sputtering target is a 99.95%-99.99% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Tantalum (Ta) Wire, 99.95% Purity (Request Current Price) ZHC LAB Tantalum (Ta) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material…
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$9,999.99
Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Carbide (TaC) sputtering target is a 99.9% purity refractory carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Tantalum Diboride (TaB2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Diboride (TaB2) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Tantalum Iron Antimony Alloy (TaFeSb) Ingots, 99.9% Purity (Request Current Price) ZHC LAB Tantalum Iron Antimony Alloy (TaFeSb) ingots are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material…
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$9,999.99
Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Nitride (TaN) sputtering target is a 99.9% purity refractory nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Tantalum Oxide (Ta2O5) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Tantalum Oxide (Ta2O5) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
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$9,999.99
Tantalum Pentoxide (Ta2O5) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Pentoxide (Ta2O5) sputtering target is a high-purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$199.99 – $249.99Price range: $199.99 through $249.99
Tantalum-Doped Lithium Lanthanum Zirconium Oxide (Li6.4La3Zr1.4Ta0.6O12, LLZTO) Solid Electrolyte Pellet Application: Solid Electrolyte for All-Solid-State Batteries Product Overview: This is a high-performance garnet-type oxide solid electrolyte, known for its high ionic conductivity at room temperature and excellent stability against lithium metal. Key Specifications (Available Models): Chemical Formula: Li6.4La3Zr1.4Ta0.6O12 Dimensions: Pellets typically available in Dia. 16…
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$9,999.99
Tellurium (Te) Granules And Pieces, 99.99%-99.9999% Purity (Request Current Price) ZHC LAB Tellurium (Te) granules and pieces are high-purity evaporation source materials supplied for thin-film deposition research, PVD source loading, compound precursor studies, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity…
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$167.99 – $971.99Price range: $167.99 through $971.99
Tellurium (Te) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Tellurium (Te) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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$67.00 – $107.00Price range: $67.00 through $107.00
Tellurium Dioxide (TeO2) Single Crystal Substrate Physical Properties: Crystal Structure: Tetragonal System Lattice Constants: a=b=4.81 Angstrom, c=7.613 Angstrom Density: 5.99 g/cm^3 Melting Point: 733 degC Mohs Hardness: 4 Mohs Growth Method: CZ Standard Specifications: Orientation: (110) miscut < 0.5 deg Edge Orientation: request
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$289.00 – $389.00Price range: $289.00 through $389.00
Terbium Gallium Garnet (TGG / Tb3Ga5O12) Single Crystal Substrate Physical Properties: Crystal Structure: Cubic System Lattice Constant: a=12.355 Angstrom Density: 7.13 g/cm^3 Mohs Hardness: 8 Mohs Melting Point: 1725 degC Transmittance Range: 400 ~ 1100 nm Verdet Constant: 40 rad/T/m @1064nm Growth Method: CZ Standard Specifications: Orientation: (111) miscut < 0.3 deg Edge Orientation: Available
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$9,999.99
Terbium Oxide (Tb2O3) Evaporation Pellets, 99.95% Purity (Request Current Price) ZHC LAB Terbium Oxide (Tb2O3) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
