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Showing 929–944 of 1047 results
L-shape Electrode Holder features a Ti contact part with PTFE insulation, offering excellent conductivity, chemical resistance, and reliable insulation performance. It is suitable for stable electrical connection in electrochemical experiments and is widely used in laboratory testing and research applications requiring durable and corrosion-resistant electrode accessories.
Titanium Mesh This titanium mesh is fabricated from 99.5% high-purity titanium using a plain-weave structure. It offers low density, excellent corrosion resistance, and high mechanical robustness, making it suitable for use in strong acid and strong alkali environments. The product is commonly employed as a current collector for capacitors and lithium-ion batteries, and can also…
Titanium Molybdenum Alloy (TiMo) Pellets And Pieces, 99.9% Purity (Request Current Price) ZHC LAB Titanium Molybdenum Alloy (TiMo) pellets and pieces are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows…
Titanium Monoxide (TiO) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Monoxide (TiO) sputtering target is a 99.9% purity titanium monoxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
Titanium Nitride (TiN) Evaporation Pellets, 99.9% Purity ZHC LAB Titanium Nitride (TiN) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…
Titanium Nitride (TiN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Nitride (TiN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
Titanium Pentoxide (Ti3O5) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Titanium Pentoxide (Ti3O5) sputtering target is a 99.99% purity titanium oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
Titanium Silicon Alloy (TiSi) Sputtering Target, 99.9% Purity, Ti:Si = 1:1 at%, Circular ZHC LAB’s Titanium Silicon Alloy (TiSi) sputtering target is a 99.9% purity, ti:si = 1:1 at% binary alloy and silicide research source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
Titanium Silicon Molybdenum Alloy (TiSiMo) Sputtering Target, 99.9% Purity, Ti:Si:Mo = 1:1:2 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Molybdenum Alloy (TiSiMo) sputtering target is a 99.9% purity, ti:si:mo = 1:1:2 at% ternary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
Titanium Silicon Tantalum Alloy (TiSiTa) Sputtering Target, 99.9% Purity, Ti:Si:Ta = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Tantalum Alloy (TiSiTa) sputtering target is a 99.9% purity, ti:si:ta = 1:1:1 at% ternary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
Titanium Telluride (TiTe2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Telluride (TiTe2) sputtering target is a 99.9% purity transition-metal chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
Titanium Zirconium Hafnium Niobium Tantalum Alloy (TiZrHfNbTa) Ingots, 99.9% Purity (Request Current Price) ZHC LAB Titanium Zirconium Hafnium Niobium Tantalum Alloy (TiZrHfNbTa) ingots are high-purity alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch…
Titanium(II) Oxide (TiO) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Titanium(II) Oxide (TiO) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
Titanium(III,V) Oxide (Ti3O5) Evaporation Pellets, 99.99% Purity ZHC LAB Titanium(III,V) Oxide (Ti3O5) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity…
Titanium(III) Oxide (Ti2O3) Evaporation Pellets, 99.99% Purity (Request Current Price) ZHC LAB Titanium(III) Oxide (Ti2O3) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and…
Titanium(III) Oxide (Ti2O3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium(III) Oxide (Ti2O3) sputtering target is a 99.9% purity titanium oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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