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Showing 113–128 of 209 results
Natural Mica Disc Substrates for AFM/SEM Microscopy Natural muscovite mica discs are high-quality crystalline circular substrates, precision-cut for microscopy sample holders. Available as Dia. 13 × 0.38 mm discs, pack of 10. Key Specifications: – Format: Circular disc, Dia. 13 mm – Material: High-purity Natural Muscovite Mica [KAl2(AlSi3O10)(OH)2] – Thickness: 0.38 mm (standard TEM support…
Natural Mica Substrate Sheets for AFM/SEM Microscopy Natural muscovite mica sheets are high-quality crystalline substrates processed through precision peeling and cutting. Available as 11 × 11 mm square sheets (0.1 mm thick), pack of 10. Key Specifications: – Format: Square sheet, 11 × 11 mm – Material: High-purity Natural Muscovite Mica [KAl2(AlSi3O10)(OH)2] – Thickness: 0.1…
Product Name: Nb-doped Strontium Titanate (Nb:SrTiO3) Conductive Single Crystal Substrates Packaging & Variant Options: – Packaging: 100-class clean bag, 1000-class clean room – Available Dimensions (Square/Rectangular): – 5 × 5 mm, 10 × 3 mm, 10 × 5 mm, 10 × 10 mm, 15 × 15 mm, 20 × 15 mm, 20 × 20 mm…
Nd:YAG (1.0 at.%) Single Crystal Wafers Main Specifications Dimensional tolerance: Dia: < +/-0.05 mm Flatness: λ/8 @633nm Surface fineness: 10/5 Flatness 30 arc sec. Verticality 5 arc min Coating film AR coating, HR Coating Reflect R<0.2%@1064, HR:R>99.5%@1064, R<5%@808nm Clear aperture >95% central area
Neodymium Aluminate (NdAlO3) Single Crystal Substrate Product Overview: NdAlO3 is a perovskite-type single crystal substrate material. It is an ideal substrate for the epitaxial growth of high-temperature superconductor (HTS) thin films (such as YBCO) and magnetic manganite thin films due to its good lattice matching and chemical stability. Physical Properties: – Crystal Structure: Cubic System…
Neodymium Gallate (NdGaO3) Single Crystal Substrate Physical Properties: – Crystal Structure: Orthorhombic System – Lattice Constants: a=5.167 Angstrom, b=5.314 Angstrom, c=7.353 Angstrom (Angles: a(100) θ=17°20’; b(010) θ=16°52’; c(001) θ=12°04’) – Density: 7.57 g/cm^3 – Melting Point: 1600 °C – Hardness: 5.9 (Mohs) – Growth Method: Czochralski (CZ) Standard Specifications: 1. Orientation – (110) miscut <0.3°…
Neodymium Gallium Garnet (NGG / Nd3Ga5O12) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=12.505 Angstrom – Density: 6.6 g/cm^3 – Melting Point: 1550 °C – Hardness: 7.2 (Mohs) – Growth Method: Czochralski (CZ) Standard Specifications: 1. Orientation – (111) miscut < 0.3° (customizable <0.1°) 2. Edge Orientation – (110)…
Nickel Sheet (Ni) – High Purity Polycrystalline High Purity Nickel Sheet is a polycrystalline metallic substrate widely used in electroplating, catalysis, thin film deposition, battery research, and surface science applications. Nickel exhibits excellent corrosion resistance, good mechanical strength, high thermal stability, and strong magnetic properties at room temperature. Our nickel sheets are manufactured from high-purity…
Nickel (Ni) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: 3.25 Angstrom – Melting Point: 1453 °C – Density: 8.902 g/cm^3 – Mohs Hardness: 4 – Growth Method: Czochralski or Bridgman Standard Specifications: – Orientation Accuracy: miscut < 2.0° – Surface Roughness: Ra < 10 nm – Edge Orientation: Available
Nickel Oxide (NiO) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=4.18 Angstrom – Melting Point: 1984 °C – Density: 6.8 g/cm^3 – Mohs Hardness: 5.5 (Mohs) – Color: dark pistachio-green
Nickel-Coated Silicon Substrates (Ni on Si (100)) Overview Our nickel-coated silicon substrates are precision-cut from research-grade Ni thin film wafers fabricated on Si (100) substrates using high-vacuum magnetron sputtering. Nickel films are widely used in alkaline electrolysis, oxygen evolution reaction (OER), hydrogen evolution reaction (HER), and electrode development due to their excellent catalytic activity and…
Nickel-Coated Silicon Wafers (Ni on Si (100)) Overview Our nickel-coated silicon wafers are fabricated using high-vacuum magnetron sputtering to ensure uniform thickness, strong adhesion, and stable surface quality suitable for electrochemical and materials research. Nickel films are widely used in alkaline electrolysis, oxygen evolution reaction (OER), hydrogen evolution reaction (HER), and electrode development due to…
Optical-Grade Transparent [KMg3(AlSi3O10)F2] Fluorophlogopite Mica Disc Physical Properties: – Formula: KMg3(AlSi3O10)F2 – Melting Point: 1375 °C – Long-term Operating Temperature: 1100 °C – Preparation Method: Platinum Crucible Melting Method
OFHC Copper Foil/sheets (99.99% Purity) – High Conductivity Research Grade Our Oxygen-Free High Conductivity (OFHC) Copper Foil is manufactured from high-purity copper (≥99.99%), offering excellent electrical conductivity, thermal performance, and superior ductility. With extremely low oxygen content, this material ensures high reliability in demanding research, vacuum, and electronics applications. Designed for laboratory, semiconductor, battery research,…
Platinum-Coated Silicon Substrates (Pt/Ti on Si (100)) Overview Our platinum-coated silicon chips are precision-cut from research-grade Pt/Ti on Si (100) wafers and fabricated using high-vacuum magnetron sputtering to ensure uniform thickness, strong adhesion, and high surface quality. A titanium (Ti) adhesion layer is deposited between the silicon substrate and the platinum film to provide excellent…
Platinum-Coated Silicon Wafers (Pt/Ti on Si (100)) Overview Our platinum-coated silicon substrates are fabricated using high-vacuum magnetron sputtering to ensure uniform thickness, excellent adhesion, and high surface quality suitable for advanced research and device fabrication. A titanium (Ti) adhesion layer is deposited between the silicon substrate and the platinum layer to provide strong interfacial bonding…
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