Showing 225–233 of 233 results

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    Zinc Antimonide (ZnSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Zinc Antimonide (ZnSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Zinc Antimonide (ZnSb) sputtering target is a 99.99% purity semiconductor compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Zinc Oxide (ZnO) Sputtering Target, 99.99% Purity, Intrinsic, Circular

    Price range: $306.99 through $713.99

    Zinc Oxide (ZnO) Sputtering Target, 99.99% Purity, Intrinsic, Circular ZHC LAB’s Zinc Oxide (ZnO) sputtering target is a 99.99% purity, intrinsic oxide semiconductor ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…

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    Zinc Oxide (ZnO) Sputtering Target, 99.99% Purity, Non-Intrinsic, Circular

    Price range: $156.99 through $334.99

    Zinc Oxide (ZnO) Sputtering Target, 99.99% Purity, Non-Intrinsic, Circular ZHC LAB’s Zinc Oxide (ZnO) sputtering target is a 99.99% purity, non-intrinsic oxide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Zinc Sulfide (ZnS) Sputtering Target, 99.99% Purity, Circular

    Price range: $349.99 through $656.99

    Zinc Sulfide (ZnS) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Zinc Sulfide (ZnS) sputtering target is a 99.99% purity compound sulfide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…

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    Zinc Telluride (ZnTe) Sputtering Target, 99.99% Purity, Circular

    Price range: $456.99 through $913.99

    Zinc Telluride (ZnTe) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Zinc Telluride (ZnTe) sputtering target is a 99.99% purity II-VI semiconductor compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…

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    Zirconium Carbide (ZrC) Sputtering Target, 99.5% Purity, Circular

    Price range: $878.99 through $1,374.99

    Zirconium Carbide (ZrC) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Zirconium Carbide (ZrC) sputtering target is a 99.5% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Zirconium Diboride (ZrB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    $9,999.99

    Zirconium Diboride (ZrB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Zirconium Diboride (ZrB2) sputtering target is a 99.5% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Zirconium Nitride (ZrN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    $9,999.99

    Zirconium Nitride (ZrN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Zirconium Nitride (ZrN) sputtering target is a 99.5% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Zirconium Oxide (ZrO2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Zirconium Oxide (ZrO2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Zirconium Oxide (ZrO2) sputtering target is a 99.9% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

    Select optionsDone This product has multiple variants. The options may be chosen on the product page