Showing 33–48 of 233 results

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    Chromium Diboride (CrB2) Sputtering Target, 99.5% Purity, Circular

    Price range: $584.99 through $934.99

    Chromium Diboride (CrB2) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Diboride (CrB2) sputtering target is a 99.5% purity transition-metal boride ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Chromium Disilicide (CrSi2) Sputtering Target, 99.9% Purity, Circular

    Price range: $406.99 through $870.99

    Chromium Disilicide (CrSi2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Chromium Disilicide (CrSi2) sputtering target is a 99.9% purity transition-metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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    Chromium Nitride (CrN) Sputtering Target, 99.5% Purity, Circular

    Price range: $506.99 through $1,013.99

    Chromium Nitride (CrN) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Nitride (CrN) sputtering target is a 99.5% purity transition-metal nitride ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Chromium Vanadium Alloy (CrV) Sputtering Target, 99.9% Purity, Cr:V = 1:1 at%, Circular (Price Upon Request)

    $9,999.99

    Chromium Vanadium Alloy (CrV) Sputtering Target, 99.9% Purity, Cr:V = 1:1 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Vanadium Alloy (CrV) sputtering target is a 99.9% purity, cr:v = 1:1 at% binary transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…

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    Chromium(III) Oxide (Cr2O3) Sputtering Target, 99.99% Purity, Circular

    $343.99

    Chromium(III) Oxide (Cr2O3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Chromium(III) Oxide (Cr2O3) sputtering target is a 99.99% purity transition-metal oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Cobalt (Co) Sputtering Target, 99.95% (3N5) Purity, Circular

    Price range: $94.99 through $272.99

    Cobalt (Co) Sputtering Target, 99.95% (3N5) Purity, Circular (Price Upon Request) ZHC LAB’s Cobalt (Co) sputtering target is a high-purity magnetic metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…

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    Cobalt Iron Boron Alloy (CoFeB) Sputtering Target, 99.9% Purity, Co:Fe:B = 40:40:20 at%, Circular (Price Upon Request)

    $9,999.99

    Cobalt Iron Boron Alloy (CoFeB) Sputtering Target, 99.9% Purity, Co:Fe:B = 40:40:20 at%, Circular (Price Upon Request) ZHC LAB’s Cobalt Iron Boron Alloy (CoFeB) sputtering target is a 99.9% purity, co:fe:b = 40:40:20 at% magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…

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    Cobalt Oxide (CoO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Cobalt Oxide (CoO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Cobalt Oxide (CoO) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Cobalt(II,III) Oxide (Co3O4) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Cobalt(II,III) Oxide (Co3O4) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Cobalt(II,III) Oxide (Co3O4) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Cobalt(III) Oxide (Co2O3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Cobalt(III) Oxide (Co2O3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Cobalt(III) Oxide (Co2O3) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Copper (Cu) Sputtering Target, 99.99% (4N) Purity, Circular

    Price range: $87.99 through $118.99

    Copper (Cu) Sputtering Target, 99.99% (4N) Purity, Circular ZHC LAB’s Copper (Cu) Sputtering Target is a high-purity circular disc manufactured for magnetron sputtering deposition of copper thin films. The target is produced from 99.99% (4N) purity copper feedstock through controlled large-deformation processing to achieve a fine, uniform grain structure that promotes consistent sputter erosion rates,…

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    Copper (Cu) Sputtering Target, 99.995% Purity, Circular

    Price range: $68.99 through $147.99

    Copper (Cu) Sputtering Target, 99.995% Purity, Circular (Price Upon Request) ZHC LAB’s Copper (Cu) sputtering target is a 99.995% purity high-purity conductive metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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    Copper (Cu) Sputtering Target, 99.9995%-99.9999% Purity, Circular

    Price range: $124.99 through $404.99

    Copper (Cu) Sputtering Target, 99.9995%-99.9999% Purity, Circular (Price Upon Request) ZHC LAB’s Copper (Cu) sputtering target is a 99.9995%-99.9999% purity ultra-high-purity conductive metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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    Copper Gallium Selenide (CuGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request)

    $9,999.99

    Copper Gallium Selenide (CuGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) ZHC LAB’s Copper Gallium Selenide (CuGaSe) sputtering target is a 99.99% purity, custom composition custom copper chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…

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    Copper Indium Gallium Selenide (CIGS) Sputtering Target, 99.99% Purity, Cu:In:Ga:Se = 1:0.7:0.3:2 at%, Circular (Price Upon Request)

    $9,999.99

    Copper Indium Gallium Selenide (CIGS) Sputtering Target, 99.99% Purity, Cu:In:Ga:Se = 1:0.7:0.3:2 at%, Circular (Price Upon Request) ZHC LAB’s Copper Indium Gallium Selenide (CIGS) sputtering target is a 99.99% purity, cu:in:ga:se = 1:0.7:0.3:2 at% compound semiconductor chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…

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    Copper Indium Gallium Selenide (CIGS) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request)

    $9,999.99

    Copper Indium Gallium Selenide (CIGS) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) ZHC LAB’s Copper Indium Gallium Selenide (CIGS) sputtering target is a 99.99% purity, custom composition custom quaternary chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…

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