Showing 193–208 of 233 results
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$234.99 – $406.99Price range: $234.99 through $406.99
Titanium Diboride (TiB2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Diboride (TiB2) sputtering target is a 99.9% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$163.99 – $334.99Price range: $163.99 through $334.99
Titanium Dioxide (TiO2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Titanium Dioxide (TiO2) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$584.99 – $999.99Price range: $584.99 through $999.99
Titanium Disilicide (TiSi2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Disilicide (TiSi2) sputtering target is a 99.9% purity metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$584.99 – $977.99Price range: $584.99 through $977.99
Titanium Monoxide (TiO) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Monoxide (TiO) sputtering target is a 99.9% purity titanium monoxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$213.99 – $684.99Price range: $213.99 through $684.99
Titanium Nitride (TiN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Nitride (TiN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$480.99 – $870.99Price range: $480.99 through $870.99
Titanium Pentoxide (Ti3O5) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Titanium Pentoxide (Ti3O5) sputtering target is a 99.99% purity titanium oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$656.99 – $727.99Price range: $656.99 through $727.99
Titanium Silicon Alloy (TiSi) Sputtering Target, 99.9% Purity, Ti:Si = 1:1 at%, Circular ZHC LAB’s Titanium Silicon Alloy (TiSi) sputtering target is a 99.9% purity, ti:si = 1:1 at% binary alloy and silicide research source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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$9,999.99
Titanium Silicon Molybdenum Alloy (TiSiMo) Sputtering Target, 99.9% Purity, Ti:Si:Mo = 1:1:2 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Molybdenum Alloy (TiSiMo) sputtering target is a 99.9% purity, ti:si:mo = 1:1:2 at% ternary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
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$9,999.99
Titanium Silicon Tantalum Alloy (TiSiTa) Sputtering Target, 99.9% Purity, Ti:Si:Ta = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Tantalum Alloy (TiSiTa) sputtering target is a 99.9% purity, ti:si:ta = 1:1:1 at% ternary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
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$641.99 – $1,184.99Price range: $641.99 through $1,184.99
Titanium Telluride (TiTe2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Telluride (TiTe2) sputtering target is a 99.9% purity transition-metal chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$406.99 – $931.99Price range: $406.99 through $931.99
Titanium(III) Oxide (Ti2O3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium(III) Oxide (Ti2O3) sputtering target is a 99.9% purity titanium oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$86.99 – $1,234.99Price range: $86.99 through $1,234.99
Tungsten (W) Sputtering Target, 99.95%-99.999% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten (W) sputtering target is a 99.95%-99.999% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Tungsten Carbide (WC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten Carbide (WC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$9,999.99
Tungsten Disilicide (WSi2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten Disilicide (WSi2) sputtering target is a 99.9% purity refractory metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$779.99 – $1,718.99Price range: $779.99 through $1,718.99
Tungsten Disulfide (WS2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten Disulfide (WS2) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Tungsten Ditelluride (WTe2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten Ditelluride (WTe2) sputtering target is a 99.9% purity transition-metal dichalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
