Showing 177–192 of 233 results

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    Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Nitride (TaN) sputtering target is a 99.9% purity refractory nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tantalum Pentoxide (Ta2O5) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request)

    $9,999.99

    Tantalum Pentoxide (Ta2O5) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Pentoxide (Ta2O5) sputtering target is a high-purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Tellurium (Te) Sputtering Target, 99.99% Purity, Circular

    Price range: $167.99 through $971.99

    Tellurium (Te) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Tellurium (Te) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…

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    Thulium Iron Garnet (Tm3Fe5O12) Sputtering Target, Stoichiometric Composition, Circular (Price Upon Request)

    $9,999.99

    Thulium Iron Garnet (Tm3Fe5O12) Sputtering Target, Stoichiometric Composition, Circular (Price Upon Request) ZHC LAB’s Thulium Iron Garnet (Tm3Fe5O12) sputtering target is a stoichiometric composition rare-earth iron garnet ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…

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    Thulium Oxide (Tm2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Thulium Oxide (Tm2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Thulium Oxide (Tm2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tin (Sn) Sputtering Target, 99.999% (5N) Purity, Circular

    Price range: $74.99 through $424.99

    Tin (Sn) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) ZHC LAB’s Tin (Sn) sputtering target is a high-purity high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…

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    Tin Dioxide (SnO2) Sputtering Target, 99.99% Purity, Circular

    Price range: $474.99 through $1,699.99

    Tin Dioxide (SnO2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Dioxide (SnO2) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…

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    Tin Diselenide (SnSe2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Tin Diselenide (SnSe2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Diselenide (SnSe2) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tin Disulfide (SnS2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Tin Disulfide (SnS2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Disulfide (SnS2) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tin Selenide (SnSe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Tin Selenide (SnSe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Selenide (SnSe) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tin Sulfide (SnS) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Tin Sulfide (SnS) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Sulfide (SnS) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tin Telluride (SnTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Tin Telluride (SnTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Telluride (SnTe) sputtering target is a 99.99% purity telluride semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…

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    Titanium (Ti) Sputtering Target, 99.995% (4N5) Purity, Circular

    Price range: $97.99 through $314.99

    Titanium (Ti) Sputtering Target, 99.995% (4N5) Purity, Circular ZHC LAB’s Titanium (Ti) sputtering target is a high-purity high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…

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    Titanium Aluminum Alloy (TiAl) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Titanium Aluminum Alloy (TiAl) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Titanium Aluminum Alloy (TiAl) sputtering target is a 99.9% purity lightweight high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Titanium Antimony Alloy (TiSb) Sputtering Target, 99.9% Purity, Ti:Sb = 2:3 at%, Circular (Price Upon Request)

    $9,999.99

    Titanium Antimony Alloy (TiSb) Sputtering Target, 99.9% Purity, Ti:Sb = 2:3 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Antimony Alloy (TiSb) sputtering target is a 99.9% purity, ti:sb = 2:3 at% custom binary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…

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    Titanium Carbide (TiC) Sputtering Target, 99.9% Purity, Circular

    Price range: $329.99 through $777.99

    Titanium Carbide (TiC) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Carbide (TiC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…

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