Showing 17–32 of 233 results
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$413.99 – $856.99Price range: $413.99 through $856.99
Bismuth Oxide (Bi2O3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Bismuth Oxide (Bi2O3) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$9,999.99
Bismuth Oxyselenide (Bi2O2Se) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Bismuth Oxyselenide (Bi2O2Se) sputtering target is a 99.9% purity layered oxychalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$613.99 – $870.99Price range: $613.99 through $870.99
Bismuth Selenide (Bi2Se3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Bismuth Selenide (Bi2Se3) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$727.99 – $941.99Price range: $727.99 through $941.99
Bismuth Sulfide (Bi2S3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Bismuth Sulfide (Bi2S3) sputtering target is a 99.9% purity bismuth chalcogenide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$534.99 – $999.99Price range: $534.99 through $999.99
Bismuth Telluride (Bi2Te3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Bismuth Telluride (Bi2Te3) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$536.99 – $1,024.99Price range: $536.99 through $1,024.99
Boron (B) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Boron (B) sputtering target is a 99.9% purity high-purity nonmetal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
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$341.99 – $634.99Price range: $341.99 through $634.99
Boron Carbide (B4C) Sputtering Target, 99% Purity, Circular ZHC LAB’s Boron Carbide (B4C) sputtering target is a 99% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$159.99 – $413.99Price range: $159.99 through $413.99
Boron Nitride (BN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Boron Nitride (BN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$480.99 – $913.99Price range: $480.99 through $913.99
Calcium Fluoride (CaF2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Calcium Fluoride (CaF2) sputtering target is a 99.99% purity fluoride optical ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$9,999.99
Cerium Oxide (CeO2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Cerium Oxide (CeO2) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$89.99 – $414.99Price range: $89.99 through $414.99
Chromium (Cr) Sputtering Target, 99.95%-99.99% Purity, Circular ZHC LAB’s Chromium (Cr) sputtering target is a 99.95%-99.99% purity transition-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important….
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$9,999.99
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 60:20:17:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 60:20:17:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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$9,999.99
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 67:22:8:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 67:22:8:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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$9,999.99
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity antimonide compound source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$9,999.99
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Cr:Sb = 1:1.2 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity, cr:sb = 1:1.2 at% antimonide compound source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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$480.99 – $941.99Price range: $480.99 through $941.99
Chromium Carbide (Cr3C2) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Carbide (Cr3C2) sputtering target is a 99.5% purity transition-metal carbide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
