Showing 209–224 of 233 results
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$9,999.99
Tungsten Rhenium Alloy (W-Re) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten Rhenium Alloy (W-Re) sputtering target is a 99.99% purity high-temperature refractory alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Tungsten Titanium Alloy (WTi) Sputtering Target, 99.99% Purity, W:Ti = 90:10 wt%, Circular (Price Upon Request) ZHC LAB’s Tungsten Titanium Alloy (WTi) sputtering target is a 99.99% purity, w:ti = 90:10 wt% refractory metal alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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$9,999.99
Tungsten Trioxide (WO3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tungsten Trioxide (WO3) sputtering target is a 99.99% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Tungsten Trioxide (WO3) Sputtering Target, 99.99% Purity, Oxygen-Deficient Dark Gray Grade, Circular (Price Upon Request) ZHC LAB’s Tungsten Trioxide (WO3) sputtering target is a 99.99% purity, oxygen-deficient dark gray grade oxygen-deficient tungsten oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$128.99 – $632.99Price range: $128.99 through $632.99
Vanadium (V) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium (V) sputtering target is a 99.9% purity high-purity transition metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Vanadium Carbide (VC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Carbide (VC) sputtering target is a 99.9% purity transition-metal carbide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Vanadium Diboride (VB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Diboride (VB2) sputtering target is a 99.5% purity transition-metal boride ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Vanadium Dioxide (VO2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Dioxide (VO2) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Vanadium Disilicide (VSi2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Disilicide (VSi2) sputtering target is a 99.9% purity transition-metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$9,999.99
Vanadium Nitride (VN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Nitride (VN) sputtering target is a 99.5% purity transition-metal nitride ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Ytterbium Oxide (Yb2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Ytterbium Oxide (Yb2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Yttria-Stabilized Zirconia (ZrO2:Y2O3) Sputtering Target, 99.9% Purity, ZrO2:Y2O3 = 92:8 at%, Circular (Price Upon Request) ZHC LAB’s Yttria-Stabilized Zirconia (ZrO2:Y2O3) sputtering target is a 99.9% purity, zro2:y2o3 = 92:8 at% yttria-doped zirconia ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$534.99 – $941.99Price range: $534.99 through $941.99
Yttrium Fluoride (YF3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Yttrium Fluoride (YF3) sputtering target is a 99.99% purity rare-earth fluoride optical source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$513.99 – $9,999.99Price range: $513.99 through $9,999.99
Yttrium Iron Garnet (Y3Fe5O12) Sputtering Target, 99.99% Purity, Circular (Select Options Price Upon Request) ZHC LAB’s Yttrium Iron Garnet (Y3Fe5O12) sputtering target is a 99.99% purity magnetic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work…
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$320.99 – $699.99Price range: $320.99 through $699.99
Yttrium Oxide (Y2O3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Yttrium Oxide (Y2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$97.99 – $289.99Price range: $97.99 through $289.99
Zinc (Zn) Sputtering Target, 99.995% Purity, Circular ZHC LAB’s Zinc (Zn) sputtering target is a 99.995% purity high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
