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Showing 49–64 of 233 results
Copper Oxide (CuO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Copper Oxide (CuO) sputtering target is a 99.9% purity p-type oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Copper Selenide (CuSe) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Copper Selenide (CuSe) sputtering target is a 99.9% purity copper chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
Copper Sulfide (CuS) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Copper Sulfide (CuS) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
Copper Tin Selenide (CuSnSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) ZHC LAB’s Copper Tin Selenide (CuSnSe) sputtering target is a 99.99% purity, custom composition custom copper chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
Cuprous Oxide (Cu2O) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Cuprous Oxide (Cu2O) sputtering target is a 99.9% purity p-type oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Cuprous Selenide (Cu2Se) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Cuprous Selenide (Cu2Se) sputtering target is a 99.99% purity copper chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
Cuprous Sulfide (Cu2S) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Cuprous Sulfide (Cu2S) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
Erbium Oxide (Er2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Erbium Oxide (Er2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Europium Oxide (Eu2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Europium Oxide (Eu2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Fluorine-Doped Tin Oxide (FTO) Sputtering Target, 99.99% Purity, SnO2:F = 90:10 wt%, Circular (Price Upon Request) ZHC LAB’s Fluorine-Doped Tin Oxide (FTO) sputtering target is a 99.99% purity, sno2:f = 90:10 wt% transparent conductive oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
Fluorine-Doped Tin Oxide (FTO) Sputtering Target, 99.99% Purity, SnO2:F = 95:5 wt%, Circular (Price Upon Request) ZHC LAB’s Fluorine-Doped Tin Oxide (FTO) sputtering target is a 99.99% purity, sno2:f = 95:5 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
Gadolinium Oxide (Gd2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Gadolinium Oxide (Gd2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
Gallium Antimonide (GaSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Gallium Antimonide (GaSb) sputtering target is a 99.99% purity III-V compound semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
Gallium Nitride (GaN) Sputtering Target, 99.99% (4N) Purity, Circular ZHC LAB’s Gallium Nitride (GaN) sputtering target is a high-purity compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
Gallium Oxide (Ga2O3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Gallium Oxide (Ga2O3) sputtering target is a 99.99% purity wide-bandgap oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
Gallium Sulfide (GaS) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Gallium Sulfide (GaS) sputtering target is a 99.9% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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