Showing 161–176 of 233 results

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    Silicon Nitride (Si3N4) Sputtering Target, 99.9% Purity, Circular

    Price range: $469.99 through $1,018.99

    Silicon Nitride (Si3N4) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Silicon Nitride (Si3N4) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Silicon Telluride (Si2Te3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Silicon Telluride (Si2Te3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Silicon Telluride (Si2Te3) sputtering target is a 99.99% purity telluride chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…

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    Silver (Ag) Sputtering Target, 99.99% Purity, SEM Consumable Format, Circular (Price Upon Request)

    $9,999.99

    Silver (Ag) Sputtering Target, 99.99% Purity, SEM Consumable Format, Circular (Price Upon Request) ZHC LAB’s Silver (Ag) sputtering target is a 99.99% purity, sem consumable format noble-metal conductive PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where…

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    Silver (Ag) Sputtering Target, 99.99%-99.999% Purity, Circular

    Price range: $294.99 through $998.99

    Silver (Ag) Sputtering Target, 99.99%-99.999% Purity, Circular (Price Upon Request) ZHC LAB’s Silver (Ag) sputtering target is a 99.99%-99.999% purity noble-metal conductive PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…

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    Strontium Aluminate (Sr4Al2O7) Sputtering Target, 99.99% Purity, Circular

    Price range: $656.99 through $9,999.99

    Strontium Aluminate (Sr4Al2O7) Sputtering Target, 99.99% Purity, Circular (Select Options Price Upon Request) ZHC LAB’s Strontium Aluminate (Sr4Al2O7) sputtering target is a 99.99% purity strontium aluminate oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…

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    Strontium Cobalt Oxide (SrCoO3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Strontium Cobalt Oxide (SrCoO3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Strontium Cobalt Oxide (SrCoO3) sputtering target is a 99.99% purity perovskite oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Strontium Manganate (SrMnO3) Sputtering Target, 99.9% Purity, Circular

    Price range: $656.99 through $941.99

    Strontium Manganate (SrMnO3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Strontium Manganate (SrMnO3) sputtering target is a 99.9% purity perovskite manganite oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Strontium Molybdate (SrMoO4) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Strontium Molybdate (SrMoO4) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Strontium Molybdate (SrMoO4) sputtering target is a 99.9% purity molybdate oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Strontium Niobate (SrNbO3) Sputtering Target, 99.9% Purity, Circular

    Price range: $670.99 through $899.99

    Strontium Niobate (SrNbO3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Strontium Niobate (SrNbO3) sputtering target is a 99.9% purity conductive perovskite oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Strontium Ruthenate (SrRuO3) Sputtering Target, 99.99% Purity, Circular

    Price range: $1,541.99 through $3,056.99

    Strontium Ruthenate (SrRuO3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Strontium Ruthenate (SrRuO3) sputtering target is a 99.99% purity conductive perovskite oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Strontium Stannate (SrSnO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Strontium Stannate (SrSnO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Strontium Stannate (SrSnO3) sputtering target is a 99.9% purity perovskite stannate oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Strontium Titanate (SrTiO3) Sputtering Target, 99.99% Purity, Circular

    Price range: $334.99 through $741.99

    Strontium Titanate (SrTiO3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Strontium Titanate (SrTiO3) sputtering target is a 99.99% purity perovskite titanate oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Strontium Vanadate (SrVO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Strontium Vanadate (SrVO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Strontium Vanadate (SrVO3) sputtering target is a 99.9% purity conductive perovskite oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular

    Price range: $86.99 through $2,424.99

    Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum (Ta) sputtering target is a 99.95%-99.99% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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    Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Carbide (TaC) sputtering target is a 99.9% purity refractory carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Tantalum Diboride (TaB2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Tantalum Diboride (TaB2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Diboride (TaB2) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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