Showing 145–160 of 233 results
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$9,999.99
Niobium Disilicide (NbSi2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Niobium Disilicide (NbSi2) sputtering target is a 99.9% purity refractory metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$641.99 – $1,427.99Price range: $641.99 through $1,427.99
Niobium Nitride (NbN) Sputtering Target, 99.9% (3N) Purity, Circular ZHC LAB’s Niobium Nitride (NbN) sputtering target is a high-purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$163.99 – $363.99Price range: $163.99 through $363.99
Niobium Pentoxide (Nb2O5) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Niobium Pentoxide (Nb2O5) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$9,999.99
Niobium Tantalum Alloy (NbTa) Sputtering Target, 99.9% Purity, Nb:Ta = 1:1 at%, Circular (Price Upon Request) ZHC LAB’s Niobium Tantalum Alloy (NbTa) sputtering target is a 99.9% purity, nb:ta = 1:1 at% refractory metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$9,999.99
Niobium Titanium Oxide (Nb0.13Ti1.87O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Niobium Titanium Oxide (Nb0.13Ti1.87O3) sputtering target is a 99.99% purity mixed oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Palladium (Pd) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Palladium (Pd) sputtering target is a 99.99% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Platinum (Pt) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Platinum (Pt) sputtering target is a 99.99% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Polytetrafluoroethylene (PTFE) Sputtering Target, PTFE Polymer, Circular (Price Upon Request) ZHC LAB’s Polytetrafluoroethylene (PTFE) sputtering target is a ptfe polymer fluoropolymer source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Rhodium (Rh) Sputtering Target, 99.95% Purity, Circular ZHC LAB’s Rhodium (Rh) sputtering target is a 99.95% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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$9,999.99
Ruthenium (Ru) Sputtering Target, 99.95% Purity, Circular ZHC LAB’s Ruthenium (Ru) sputtering target is a 99.95% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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$9,999.99
Samarium Oxide (Sm2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Samarium Oxide (Sm2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Scandium Oxide (Sc2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Scandium Oxide (Sc2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$114.99 – $589.99Price range: $114.99 through $589.99
Silicon (Si) Sputtering Target, 99.999% Purity, Intrinsic / N-Type / P-Type, Circular (Price Upon Request) ZHC LAB’s Silicon (Si) sputtering target is a 99.999% purity, intrinsic / n-type / p-type semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch…
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$9,999.99
Silicon Carbide (SiC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Silicon Carbide (SiC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$171.99 – $270.99Price range: $171.99 through $270.99
Silicon Dioxide (SiO2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Silicon Dioxide (SiO2) sputtering target is a 99.99% purity oxide dielectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$306.99 – $756.99Price range: $306.99 through $756.99
Silicon Monoxide (SiO) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Silicon Monoxide (SiO) sputtering target is a 99.99% purity oxide ceramic evaporation and sputtering source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
