Showing 129–144 of 233 results

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    Molybdenum Disilicide (MoSi2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Molybdenum Disilicide (MoSi2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Disilicide (MoSi2) sputtering target is a 99.9% purity refractory metal silicide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Molybdenum Disulfide (MoS2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Molybdenum Disulfide (MoS2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Disulfide (MoS2) sputtering target is a 99.99% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Molybdenum Ditelluride (MoTe2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Molybdenum Ditelluride (MoTe2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Ditelluride (MoTe2) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Molybdenum Rhenium Alloy (MoRe) Sputtering Target, 99.95% Purity, Circular (Price Upon Request)

    $9,999.99

    Molybdenum Rhenium Alloy (MoRe) Sputtering Target, 99.95% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Rhenium Alloy (MoRe) sputtering target is a 99.95% purity refractory binary alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work…

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    Molybdenum Trioxide (MoO3) Sputtering Target, 99.99% Purity, Conductive and Non-Conductive Grades, Circular (Price Upon Request)

    $9,999.99

    Molybdenum Trioxide (MoO3) Sputtering Target, 99.99% Purity, Conductive and Non-Conductive Grades, Circular (Price Upon Request) ZHC LAB’s Molybdenum Trioxide (MoO3) sputtering target is a 99.99% purity, conductive and non-conductive grades oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…

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    Neodymium Oxide (Nd2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Neodymium Oxide (Nd2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Neodymium Oxide (Nd2O3) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Nickel (Ni) Sputtering Target, 99.995% (4N5) Purity, Circular

    Price range: $144.99 through $474.99

    Nickel (Ni) Sputtering Target, 99.995% (4N5) Purity, Circular (Price Upon Request) ZHC LAB’s Nickel (Ni) Sputtering Target is a high-purity circular PVD source material designed for magnetron sputtering, ion sputtering, and related thin-film deposition systems. With 99.995% (4N5) nickel purity and multiple standard diameters and thicknesses, this target supports research, pilot-scale process development, semiconductor device…

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    Nickel Chromium Alloy (NiCr) Sputtering Target, 99.9% Purity, Ni:Cr = 80:20, Circular (Price Upon Request)

    $9,999.99

    Nickel Chromium Alloy (NiCr) Sputtering Target, 99.9% Purity, Ni:Cr = 80:20, Circular (Price Upon Request) ZHC LAB’s Nickel Chromium Alloy (NiCr) sputtering target is a 99.9% purity, ni:cr = 80:20 resistive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…

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    Nickel Iron Alloy (NiFe) Sputtering Target, 99.9%-99.95% Purity, Ni:Fe = 80:20 / 81:19, Circular (Price Upon Request)

    $9,999.99

    Nickel Iron Alloy (NiFe) Sputtering Target, 99.9%-99.95% Purity, Ni:Fe = 80:20 / 81:19, Circular (Price Upon Request) ZHC LAB’s Nickel Iron Alloy (NiFe) sputtering target is a 99.9%-99.95% purity, ni:fe = 80:20 / 81:19 magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…

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    Nickel Iron Cobalt Alloy (NiFeCo) Sputtering Target, 99.9% Purity, Ni:Fe:Co = 1:1:1 at%, Circular (Price Upon Request)

    $9,999.99

    Nickel Iron Cobalt Alloy (NiFeCo) Sputtering Target, 99.9% Purity, Ni:Fe:Co = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Nickel Iron Cobalt Alloy (NiFeCo) sputtering target is a 99.9% purity, ni:fe:co = 1:1:1 at% ternary magnetic alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…

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    Nickel Oxide (NiO) Sputtering Target, 99.9% Purity, Circular

    Price range: $379.99 through $894.99

    Nickel Oxide (NiO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Nickel Oxide (NiO) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Nickel Titanium Alloy (NiTi) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Nickel Titanium Alloy (NiTi) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Nickel Titanium Alloy (NiTi) sputtering target is a 99.9% purity shape-memory alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…

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    Nickel Vanadium Alloy (NiV) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Nickel Vanadium Alloy (NiV) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Nickel Vanadium Alloy (NiV) sputtering target is a 99.9% purity binary metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Niobium (Nb) Sputtering Target, 99.95% Purity, Circular

    Price range: $72.99 through $468.99

    Niobium (Nb) Sputtering Target, 99.95% Purity, Circular (Select Options Price Upon Request) ZHC LAB’s Niobium (Nb) sputtering target is a 99.95% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Niobium Carbide (NbC) Sputtering Target, 99.5% Purity, Circular

    Price range: $563.99 through $884.99

    Niobium Carbide (NbC) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Niobium Carbide (NbC) sputtering target is a 99.5% purity transition-metal carbide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Niobium Diselenide (NbSe2) Sputtering Target, 99.9% Purity, Circular

    Price range: $827.99 through $1,199.99

    Niobium Diselenide (NbSe2) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Niobium Diselenide (NbSe2) sputtering target is a 99.9% purity transition-metal dichalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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