Showing 65–80 of 233 results
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$727.99 – $1,049.99Price range: $727.99 through $1,049.99
Gallium Telluride (Ga2Te3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Gallium Telluride (Ga2Te3) sputtering target is a 99.99% purity compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$356.99 – $899.99Price range: $356.99 through $899.99
Gallium-Doped Zinc Oxide (GZO) Sputtering Target, Custom ZnO:Ga2O3 Composition, Circular ZHC LAB’s Gallium-Doped Zinc Oxide (GZO) sputtering target is a custom zno:ga2o3 composition transparent conductive oxide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work…
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$9,999.99
Germanium (Ge) Sputtering Target, 99.9999% Purity, Circular (Price Upon Request) ZHC LAB’s Germanium (Ge) sputtering target is a 99.9999% purity high-purity semiconductor material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 1:2:4 at%, Circular (Price Upon Request) ZHC LAB’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 1:2:4 at% phase-change chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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$9,999.99
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 2:2:5 at%, Circular (Price Upon Request) ZHC LAB’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 2:2:5 at% phase-change chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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$727.99 – $999.99Price range: $727.99 through $999.99
Germanium Dioxide (GeO2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Dioxide (GeO2) sputtering target is a 99.99% purity oxide glass and ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$799.99 – $1,241.99Price range: $799.99 through $1,241.99
Germanium Diselenide (GeSe2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Diselenide (GeSe2) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$1,113.99 – $1,827.99Price range: $1,113.99 through $1,827.99
Germanium Disulfide (GeS2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Disulfide (GeS2) sputtering target is a 99.99% purity chalcogenide compound source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$899.99 – $1,370.99Price range: $899.99 through $1,370.99
Germanium Selenide (GeSe) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Selenide (GeSe) sputtering target is a 99.99% purity chalcogenide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$1,113.99 – $1,927.99Price range: $1,113.99 through $1,927.99
Germanium Sulfide (GeS) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Sulfide (GeS) sputtering target is a 99.99% purity chalcogenide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$656.99 – $1,346.99Price range: $656.99 through $1,346.99
Germanium Telluride (GeTe) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Telluride (GeTe) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$9,999.99
Gold (Au) Sputtering Target, 99.999% (5N) Purity, Circular ZHC LAB’s Gold (Au) sputtering target is a high-purity noble-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important….
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$9,999.99
Gold (Au) Sputtering Target, 99.999% (5N) Purity, Circular, SEM Coating Grade (Price Upon Request) ZHC LAB’s Gold (Au) sputtering target is a high-purity noble-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$107.99 – $235.99Price range: $107.99 through $235.99
Graphite (C) Sputtering Target, 99.999% Purity, Circular ZHC LAB’s Graphite (C) sputtering target is a 99.999% purity carbon PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important….
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$9,999.99
Hafnium (Hf) Sputtering Target, 99.95% Purity, Circular (Price Upon Request) ZHC LAB’s Hafnium (Hf) sputtering target is a 99.95% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Hafnium Carbide (HfC) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Hafnium Carbide (HfC) sputtering target is a 99.5% purity ultra-high-temperature carbide ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
