Showing 81–96 of 233 results

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    Hafnium Diboride (HfB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    $9,999.99

    Hafnium Diboride (HfB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Hafnium Diboride (HfB2) sputtering target is a 99.5% purity ultra-high-temperature boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Hafnium Dioxide (HfO2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Hafnium Dioxide (HfO2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Hafnium Dioxide (HfO2) sputtering target is a 99.99% purity high-k oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Hafnium Nitride (HfN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    $9,999.99

    Hafnium Nitride (HfN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Hafnium Nitride (HfN) sputtering target is a 99.5% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

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    Hafnium Zirconium Oxide (HfO2-ZrO2) Sputtering Target, 99.99% Purity, HfO2:ZrO2 = 50:50 mol%, Circular (Price Upon Request)

    $9,999.99

    Hafnium Zirconium Oxide (HfO2-ZrO2) Sputtering Target, 99.99% Purity, HfO2:ZrO2 = 50:50 mol%, Circular (Price Upon Request) ZHC LAB’s Hafnium Zirconium Oxide (HfO2-ZrO2) sputtering target is a 99.99% purity, hfo2:zro2 = 50:50 mol% mixed high-k oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…

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    Hydroxyapatite (Ca10(PO4)6(OH)2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    $9,999.99

    Hydroxyapatite (Ca10(PO4)6(OH)2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Hydroxyapatite (Ca10(PO4)6(OH)2) sputtering target is a 99.9% purity calcium phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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    Indium (In) Sputtering Target, 99.995% Purity, Circular (Price Upon Request)

    $9,999.99

    Indium (In) Sputtering Target, 99.995% Purity, Circular (Price Upon Request) ZHC LAB’s Indium (In) sputtering target is a 99.995% purity soft post-transition metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

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    Indium Antimonide (InSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Indium Antimonide (InSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Indium Antimonide (InSb) sputtering target is a 99.99% purity III-V compound semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…

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    Indium Gallium Selenide (InGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request)

    $9,999.99

    Indium Gallium Selenide (InGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) ZHC LAB’s Indium Gallium Selenide (InGaSe) sputtering target is a 99.99% purity, custom composition custom indium gallium chalcogenide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…

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    Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In2O3:Ga2O3:ZnO = 1:1:1 mol%, Circular (Price Upon Request)

    $9,999.99

    Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In2O3:Ga2O3:ZnO = 1:1:1 mol%, Circular (Price Upon Request) ZHC LAB’s Indium Gallium Zinc Oxide (IGZO) sputtering target is a 99.99% purity, in2o3:ga2o3:zno = 1:1:1 mol% transparent oxide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…

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    Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In2O3:Ga2O3:ZnO = 1:1:2 mol%, Circular (Price Upon Request)

    $9,999.99

    Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In2O3:Ga2O3:ZnO = 1:1:2 mol%, Circular (Price Upon Request) ZHC LAB’s Indium Gallium Zinc Oxide (IGZO) sputtering target is a 99.99% purity, in2o3:ga2o3:zno = 1:1:2 mol% transparent oxide semiconductor source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…

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    Indium Oxide (In2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Indium Oxide (In2O3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Indium Oxide (In2O3) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…

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    Indium Selenide (In2Se3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Indium Selenide (In2Se3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Indium Selenide (In2Se3) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Indium Sulfide (In2S3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Indium Sulfide (In2S3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Indium Sulfide (In2S3) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

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    Indium Tin Oxide (ITO) Sputtering Target, 99.99% Purity, In2O3:SnO2 = 90:10 wt%, Circular (Price Upon Request)

    $9,999.99

    Indium Tin Oxide (ITO) Sputtering Target, 99.99% Purity, In2O3:SnO2 = 90:10 wt%, Circular (Price Upon Request) ZHC LAB’s Indium Tin Oxide (ITO) sputtering target is a 99.99% purity, in2o3:sno2 = 90:10 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…

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    Indium Tungsten Oxide (IWO) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    $9,999.99

    Indium Tungsten Oxide (IWO) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Indium Tungsten Oxide (IWO) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where…

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    Iridium (Ir) Sputtering Target, 99.95% Purity, Circular (Request Current Price)

    $9,999.99

    Iridium (Ir) Sputtering Target, 99.95% Purity, Circular ZHC LAB’s Iridium (Ir) sputtering target is a 99.95% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…

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