Showing 97–112 of 233 results
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$9,999.99
Iridium Manganese Alloy (IrMn) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Iridium Manganese Alloy (IrMn) sputtering target is a 99.9% purity magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$87.99 – $249.99Price range: $87.99 through $249.99
Iron (Fe) Sputtering Target, 99.95% Purity, Circular ZHC LAB’s Iron (Fe) sputtering target is a 99.95% purity ferromagnetic metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
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$728.99
Iron Chromium Aluminum Alloy (FeCrAl) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Iron Chromium Aluminum Alloy (FeCrAl) sputtering target is a 99.9% purity high-temperature resistance alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$9,999.99
Iron Gallium Alloy (FeGa) Sputtering Target, 99.99% Purity, Fe:Ga = 80:20 at%, Circular (Price Upon Request) ZHC LAB’s Iron Gallium Alloy (FeGa) sputtering target is a 99.99% purity, fe:ga = 80:20 at% magnetostrictive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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$9,999.99
Iron Gallium Boron Alloy (FeGaB) Sputtering Target, Fe:Ga:B = 7:2:1 at%, Fe:Ga:B = 70.4:17.6:12 at%, Circular (Price Upon Request) ZHC LAB’s Iron Gallium Boron Alloy (FeGaB) sputtering target is a fe:ga:b = 7:2:1 at%, fe:ga:b = 70.4:17.6:12 at% magnetostrictive and magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It…
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$9,999.99
Iron Manganese Alloy (FeMn) Sputtering Target, 99.9% Purity, Fe:Mn = 50:50 at%, Circular (Price Upon Request) ZHC LAB’s Iron Manganese Alloy (FeMn) sputtering target is a 99.9% purity, fe:mn = 50:50 at% magnetic transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$329.99 – $774.99Price range: $329.99 through $774.99
Iron(II,III) Oxide (Fe3O4) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Iron(II,III) Oxide (Fe3O4) sputtering target is a 99.9% purity magnetic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$429.99 – $753.99Price range: $429.99 through $753.99
Iron(III) Oxide (Fe2O3) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Iron(III) Oxide (Fe2O3) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$756.99 – $999.99Price range: $756.99 through $999.99
Lanthanum Aluminate (LaAlO3) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Lanthanum Aluminate (LaAlO3) sputtering target is a 99.9% purity perovskite aluminate oxide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$463.99 – $727.99Price range: $463.99 through $727.99
Lanthanum Hexaboride (LaB6) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Lanthanum Hexaboride (LaB6) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$9,999.99
Lanthanum Lithium Titanate (La0.5Li0.5TiO3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Lanthanum Lithium Titanate (La0.5Li0.5TiO3) sputtering target is a 99.99% purity lithium lanthanum titanate ceramic source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…
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$171.99 – $263.99Price range: $171.99 through $263.99
Lead (Pb) Sputtering Target, 99.995%-99.999% Purity, Circular ZHC LAB’s Lead (Pb) sputtering target is a 99.995%-99.999% purity high-purity soft metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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$9,999.99
Lead Telluride (PbTe) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) ZHC LAB’s Lead Telluride (PbTe) sputtering target is a high-purity narrow-bandgap compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Lead Zirconate Titanate (PZT) Sputtering Target, 99.99% Purity, PbZr0.52Ti0.48O3, Circular (Price Upon Request) ZHC LAB’s Lead Zirconate Titanate (PZT) sputtering target is a 99.99% purity, pbzr0.52ti0.48o3 piezoelectric ferroelectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work…
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$499.99 – $1,169.99Price range: $499.99 through $1,169.99
Lithium Cobalt Oxide (LiCoO2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Lithium Cobalt Oxide (LiCoO2) sputtering target is a 99.9% purity battery cathode oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where…
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$541.99 – $799.99Price range: $541.99 through $799.99
Lithium Iron Phosphate (LiFePO4) Sputtering Target, 99.9%-99.99% Purity, Circular ZHC LAB’s Lithium Iron Phosphate (LiFePO4) sputtering target is a 99.9%-99.99% purity battery cathode phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
