Showing 113–128 of 233 results
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$9,999.99
Lithium Niobate (LiNbO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Lithium Niobate (LiNbO3) sputtering target is a 99.9% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$413.99 – $799.99Price range: $413.99 through $799.99
Lithium Phosphate (Li3PO4) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Lithium Phosphate (Li3PO4) sputtering target is a 99.9% purity lithium phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$9,999.99
Lithium Tantalate (LiTaO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Lithium Tantalate (LiTaO3) sputtering target is a 99.9% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Lithium Titanate (Li4Ti5O12) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Lithium Titanate (Li4Ti5O12) sputtering target is a 99.9% purity battery anode oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$9,999.99
Lithium Vanadate (LiV3O8) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Lithium Vanadate (LiV3O8) sputtering target is a 99.9% purity lithium vanadium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$291.99 – $727.99Price range: $291.99 through $727.99
Magnesium Fluoride (MgF2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Magnesium Fluoride (MgF2) sputtering target is a 99.99% purity fluoride optical ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$291.99 – $627.99Price range: $291.99 through $627.99
Magnesium Oxide (MgO) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Magnesium Oxide (MgO) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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$231.99 – $927.99Price range: $231.99 through $927.99
Manganese (Mn) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Manganese (Mn) sputtering target is a 99.9% purity high-purity transition metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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$329.99 – $799.99Price range: $329.99 through $799.99
Manganese Dioxide (MnO2) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Manganese Dioxide (MnO2) sputtering target is a 99.99% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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$1,088.99
Manganese Selenide (MnSe) Sputtering Target, 99.9% Purity, Mn:Se 1:1 at%, Circular ZHC LAB’s Manganese Selenide (MnSe) sputtering target is a 99.9% purity, mn:se 1:1 at% compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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$9,999.99
Manganese Telluride Alloy (MnTe) Sputtering Target, 99.9% Purity, Mn:Te = 1:1.3 at%, Circular (Price Upon Request) ZHC LAB’s Manganese Telluride Alloy (MnTe) sputtering target is a 99.9% purity, mn:te = 1:1.3 at% custom chalcogenide alloy source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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$150.99 – $471.99Price range: $150.99 through $471.99
Molybdenum (Mo) Sputtering Target, 99.95%-99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum (Mo) sputtering target is a 99.95%-99.99% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$9,999.99
Molybdenum Carbide (Mo2C) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Carbide (Mo2C) sputtering target is a 99.9% purity transition-metal carbide source material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$9,999.99
Molybdenum Diboride (MoB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Diboride (MoB2) sputtering target is a 99.5% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Molybdenum Dioxide (MoO2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Dioxide (MoO2) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$9,999.99
Molybdenum Diselenide (MoSe2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Diselenide (MoSe2) sputtering target is a 99.99% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
